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	Item ID	Photo	Short Description		Product Type / Details	#		Price	Notes	Location
			Make	Model
								$
	195982	Accent Optical	Accent Optical	Caliper Elan	Lithography Equipment in Metrology Equipment	1		Inquire		Dresden, Saxony, Germany
Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement: Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement !!!MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE!!!
	190444	Accretech	Accretech	Win-Win 50 - A5000, Hurricane	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire	F*	Dresden, Saxony, Germany
Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm: Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm Serial Number: R00101DA-01 2006 DOM Still in the fab, warm idle
	190445	Accretech	Accretech	Win-Win 50 - A5000, Hurricane	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire		Dresden, Saxony, Germany
Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm: Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm Serial Number: R00103CB-01 DOM: 2006
	190446	Accretech	Accretech	Win-Win 50 - A5000, Hurricane	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire	F*	Dresden, Saxony, Germany
Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm: Accretech, Win-Win 50, A5000, Bright Field Inspection, 300mm Serial Number: R00101GB-01 DOM: 2007
	178308	Accretech	Accretech	Win-Win 50	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire	F*	Taichung, Taichung City, Taiwan
Accretech, Win-Win 50,Bright Field Inspection, 300mm: Manufactured in 2005; Status: Bagged and Skidded !!!MULTIPLE UNITS AVAILABLE!!! Please inquire
	178236	Advantest	Advantest	T5771	Automatic Test Equipment - Other in Automatic Test Equipment	1		Inquire	F*	Taichung, Taichung City, Taiwan
Advantest, Test, T5771 300mm: Status: Bagged and Skidded
	199548	Advantest	Advantest	V93000	Automatic Test Equipment - Other in Automatic Test Equipment	1		Inquire		East Fishkill, New York, United States
Advantest, Verigy 93000 PinScale Tester: Advantest, Verigy 93000 PinScale Tester Advantest 2002 V93000 Single Denisty Tester Manipulator Large Testhead Qty-544   P600 pins Qty-6     GPDPS Boards TIA -     Time Interval Anaylzer WDD -     1Ghz/320Msps 12-bit  WGD -     500Msps 12-bit AWGDigitizer AMC (E4425B)  - Qty-2 Alternate Master Clocks.TIA (DTS2077)  - WaveCrest Instrument.NP2500    Qty-1 Board.WGE -  30msps 16-bit AWG
	187528	Agilent Tech	Agilent Tech	8510	Reliability Test Equipment in Metrology Equipment	1		Inquire	F*	Burlington, VT, United States
Agilent 8510 100 GHz Sparm test system: Agilent 8510 100 GHz Sparm test system HP 8510XF (E7350A) 100 GHz test system 100 GHz VNA Includes two frequency converting test heads Tool ID: 16J1151AA Consists of:          Model                       S/N   1.   #8510C          3936A10427/  3901A07758 2.   #8510XF         US38069095 3.   #83651B         3844A00698        4.   #83621B         3844A00432 5.   #E7352L          US38069075 6.   #E7352L          US39069051
	185301	Agilent Tech	Agilent Tech	V3300	Memory Test Systems in Automatic Test Equipment	1		Inquire	F*	Singapore, Singapore
Agilent V3300, Vera Tester: Versa Tester for FZTAT (Memory portion)
	199699	Hewlett Packard	Hewlett Packard	4062UX	Parametric Wafer Testers in Test, Analysis and Measurement Equipment	1		Inquire		Singapore, Singapore
Agilent, HP, 4062UX, Parametric Tester : Agilent, HP, 4062UX, Parametric Tester
	195986	Akrion	Akrion	300mm Solvent Sink	Wafer Cleaners in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
AKRION, 300mm, UP V2 MP.2000, Solvent Sink: AKRION, 300mm, UP V2 MP.2000, Sink Wet bench for parts cleaning Tool is sitting in Subfab, disconnected. Wrapped in shrink wrap
	191276	Akrion	Akrion	MP-2000	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire	F*	Singapore, Singapore
Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink: Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink  Bagged & Skidded in Warehouse   S/N: 5589-010
	191507	Akrion	Akrion	MP-2000	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire	F*	Singapore, Singapore
Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink : Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink  Bagged & Skidded in Warehouse S/N: 5535-010
	191509	Akrion	Akrion	MP-2000	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Singapore, Singapore
Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink : Akrion, UP V2 MP-2000, 200mm, Cu Clean Sink  !!!MULTIPLE UNITS AVAILABLE!!!  PLEASE INQUIRE S/N: 5589-03
	185267	Akrion	Akrion	UP V2 MP.2000	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Singapore, Singapore
Akrion, UP V2 MP.2000, 200mm, Etch Solvent Sink: Akrion, UP V2 MP.2000, 200mm, Etch Solvent Sink ETCH SOLVENT SINK Bagged & Skidded in warehouse
	181803	Akrion	Akrion	V3	Wafer Cleaners in Wafer Fabrication Equipment	1		Inquire	F*	Singapore, Singapore
AKRION, V3, 200mm, wafer, chemical resist strip: AKRION, V3, 200mm, wafer, chemical  resist strip Tool ID: CRSSA-01
	192482	Applied Komatsu Tech	Applied Komatsu Tech	1600	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire	F*	Malta, New York, United States
AKT, 1600, PVD, Sputter Deposition, 300mm: AKT, 1600, PVD, Sputter Deposition, 300mm PVD Cluster tool including process chambers (Al 2x, Cu, Ti, sputter etch) configured for 300 mm square Configured for 300mm square, but handles up to 360mm x 460mm gen2 FPD panels 1997
	186713	Alcatel	Alcatel	ASM 180TD	Clean Room Equipment in Chambers, Components, Accessories and Other Items	1		Inquire	F*	Singapore, Singapore
Alcatel, He Leak Detector, ASM 180TD: Alcatel, He Leak Detector, ASM 180TD NOT WORKING CONDITION
	199987	Applied Materials In	Applied Materials In	Endura2 SiCoNi Chamber	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Malta, New York, United States
AMAT, Endura2, SiCoNi, Process Chamber, 300mm: AMAT, Endura2, SiCoNi, Process Chamber, 300mm
	192485	Amerimade Tech	Amerimade Tech	10 FT FAS-ENIG WET PROCESS STATION	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm: Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm Electroless Nickel Immersion Gold (ENIG) Processing Station 2016 Eagle™ M8 Wet Processing System Wet Process Station, Manual, Front Access, FM4910, 12 Ft Control System, PC/PLC Based, No Multi-Tasking Al Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible   Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling Zincation - Static Bath, Natural Polypropylene, w/ Drain Acid Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible   Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling E-Less Ni - Heated Recirculating/Filtered, PVDF, w/ Drain Immersion Gold - Heated Recirculating/Filtered, PVDF, w/ Drain (3) Quick Dump Dump Rinse Bath, Polypropylene, Dual Dump Door
	192483	Amerimade Tech	Amerimade Tech	12 FT RAS-PVCC CU ECD SYSTEM	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm: Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm Copper (Cu) ElectroChemical Deposition (ECD) Plating System 2016 Vintage
	180474	Applied Materials	Applied Materials	NanoSEM 3D	Critical Dimension Scanning Electron Microscopes in Microscopes, Optical Inspection	1		Inquire	F*	East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM: MULTIPLE UNITS AVAILBLE.  PLEASE INQUIRE. SEM - Critical Dimension (CD) Measurement Currently configured for 300mm wafers CE Marked Install Type: Stand Alone Cassette Interface: • (3) 300mm FOUP Roll-Around Ergo-Station w/Touch-Screen Status Lamp Options: • Slope Reconstruction • CH Analysis • Profile Grade • Discrete Inspection • Defect Review • ARAMS (ES8) Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz   Software Options: • Slope Reconstruction • CH Analysis • Profile Grade • Discrete Inspection • Defect Review • ARAMS (ES8
	180514	Applied Materials	Applied Materials	NanoSEM 3D	Critical Dimension Scanning Electron Microscopes in Microscopes, Optical Inspection	1		Inquire	F*	East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM: Applied Materials NanoSEM 3D, 300mm wafers, CD SEM MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE. SEM - Critical Dimension (CD) Measurement Currently configured for 300mm wafers CE Marked Install Type: Stand Alone Cassette Interface: • (3) 300mm FOUP Roll-Around Ergo-Station w/Touch-Screen Status Lamp Options: • Slope Reconstruction • CH Analysis • Profile Grade • Discrete Inspection • Defect Review • ARAMS (ES8) Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz   Software Options: • Slope Reconstruction • CH Analysis • Profile Grade • Discrete Inspection • Defect Review • ARAMS (ES8   Tool ID: KA03
	199767	Applied Materials	Applied Materials	Producer-eXT	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Applied Materials Producer-eXT, ETCH, 300mm, : Applied Materials Producer-eXT, ETCH, 300mm,  S/N: 414698
	199193	Applied Materials	Applied Materials	Reflexion	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire	F*	East Fishkill, New York, United States
Applied Materials Reflexion, 300mm, CMP: Applied Materials Reflexion  300mm CMP S/N: S118 DOM : 2001
	201135	Applied Materials In	Applied Materials In	Centura Radiance RTP Chamber	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		East Fishkill, New York, United States
Applied Materials, 300mm, Centura, Radiance RTP Chamber ONLY: Applied Materials, 300mm, Centura, Radiance RTP Chamber ONLY
	182414	Applied Materials	Applied Materials	Centura Enabler - Etch	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, AMAT, Enabler, Centura, 300mm Etch: Applied Materials, AMAT, Enabler, Centura, 300mm Etch, STATUS:  Cold Idle, Cleaned Dry Etch Applidations: MA, MB, KA, LT, 300mm wafers, 32nm TEOS Etch     Gases: C4F6, CO,CH2F2,H2,N2,O2, Ar, CF4,CHF3, CO2, NH3 MUL   Tool ID: ETX659
	182387	Applied Materials	Applied Materials	Enabler, Centura, 4 Chamber Etch	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, AMAT, Enabler, Centura, 300mm Etch, : Applied Materials, AMAT, Enabler, Centura, 300mm Etch, Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch   MULTIPLE UNITS AVAILABLE:  Please inquire.
	193144	Applied Materials	Applied Materials	Centura Etch	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Centura Etch, 300mm, : Applied Materials, Centura Etch, 300mm,  Centura AP Platform Chambers : 2 x Minos, 1 x Carina, 1 x Axion S/N : 423383
	199313	Applied Materials	Applied Materials	Centura Etch, DPS Minos	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		East Fishkill, New York, United States
Applied Materials, Centura Etch, DPS Minos, 300mm: Applied Materials, Centura Etch, DPS Minos,  300mm
	201153	Applied Materials In	Applied Materials In	Centura RTP XE	Single Chamber RTP Tools in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Applied Materials, Centura RTP XE, MOD1, 200mm: Applied Materials, Centura RTP XE, MOD1, 200mm<br /><br />2 Chamber, SMIF<br /><br />On line in the fab.<br /><br />S/N: ;;2979
	201131	Applied Materials	Applied Materials	Centura XE+	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Applied Materials, Centura, RTP XE+, 200mm: Applied Materials, Centura, RTP XE, 200mm<br /><br />TPCC Mainframe,<br /><br />3 Chamber XE+ ;<br /><br />S/N : ;304142
	192748	Applied Materials In	Applied Materials In	ComPlus 4T	Reliability Test Equipment in Metrology Equipment	1		Inquire		East Fishkill, New York, United States
Applied Materials, ComPlus 4T, Defect Inspection System, 300mm: Applied Materials, ComPlus 4T, Defect Inspection System, 300mm
	178309	AMAT	AMAT	Complus	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire		Singapore, Singapore
Applied Materials, Complus, Particle Measurement, 300mm: Manufactured in 2007; Status: Bagged and Skidded MULTIPLE UNITS AVAILALBE!!! Please inquire.
	198240	Applied Materials In	Applied Materials In	Dfinder2	Particle Counters in Metrology Equipment	1		Inquire		Malta, New York, United States
Applied Materials, DFinder2, 300mm Particle Counter,: Applied Materials, DFinder2, 300mm Particle Counter,
	195983	Applied Materials	Applied Materials	Elite MS MC	Scanning Electron Microscopes in Microscopes, Optical Inspection	1		Inquire		Dresden, Saxony, Germany
Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection: Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection iii Multiple Units Available.  Please inquire !!!
	201130	Applied Materials	Applied Materials	Endura 5500	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Applied Materials, Endura 5500, PVD, 200mm: Applied Materials, Endura 5500, PVD, 200mm Multi-Chamber Sputtering System, ImpTa, Clamp Alu, PCII S / N : 21117 MISSING PARTS !!!
	198243	Applied Materials In	Applied Materials In	Endura2 CHAMBER RFTi	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Malta, New York, United States
Applied Materials, Endura2, 300mm, 2 x CHAMBERs, RFTi : Applied Materials, Endura2, 300mm, CHAMBER, RFTi Two Chambers
	198246	Applied Materials In	Applied Materials In	Chamber, Endura2, ALPS	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Malta, New York, United States
Applied Materials, Endura2, 300mm, CHAMBER, ALPS: Applied Materials, Endura2, 300mm, CHAMBER, ALPS
	198245	Applied Materials In	Applied Materials In	Chamber, Endura2, RF SiCoNi	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Malta, New York, United States
Applied Materials, Endura2, 300mm, CHAMBER, SiCoNi: Applied Materials, Endura2, 300mm, CHAMBER, SiCoNi
	201826	Applied Materials In	Applied Materials In	Endura2	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Seoul, South Korea
Applied Materials, Endura2, 300mm, Co/TTN, PVD Depositon: Applied Materials, Endura2, 300mm, Co/TTN,  PVD Depositon 2x DG / 2x Std Co / 2x DS TTN S/N : 409621 80% Refurbished
	201825	Applied Materials In	Applied Materials In	Endura2	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Seoul, South Korea
Applied Materials, Endura2, 300mm, PVD, AlCu Depositon: Applied Materials, Endura2, 300mm, PVD, AlCu Depositon 2x DMD / 2x TTN / 2x Al HP / 1 PC XT / 1 TaN 80% Refurbished.
	198244	Applied Materials In	Applied Materials In	Chamber, Endura2, RF TiAl	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Malta, New York, United States
Applied Materials, Endura2, 300mm, TWO CHAMBERs , RF TiAl/N: Applied Materials, Endura2, 300mm, CHAMBER, RF TiAl Two Chambers; 1 x RFPVD TiAl Chamber,  1 x RFPVD TiN Chamber
	178356	AMAT	AMAT	Centura AP, AdvantEdge G5	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, SN, Germany
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch: Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers    Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3 Tool ID  ETX260
	178357	AMAT	AMAT	Centura	Plasma Processing Equipment and Tools - Other in Wafer Fabrication Equipment	1		Inquire	F*	Malta, NY, United States
Applied Materials, Etch, Centura Carina Chamber 300mm: Tool ID : ETX2291-c Chamber Only. Carina Etch Chamber.  Chamber Materials: ADVANCED CERAMIC Lid Materials:  AG 1000 Process Ring: QUARTZ SINGLE RING Plasma Exposed Chamber Oring: KALREZ Cathode Temperature Range: 130 TO 250C Carina Etch Swap Kit: 1 Chamber Viewport: STANDARD VIEWPORT Endpoint Type: EyeD IEP CCM Cover: NO Location is Malta, NY.
	178246	AMAT	AMAT	Ultima X	Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment	1		Inquire		Taichung, Taichung City, Taiwan
Applied Materials, HDP CVD, 300mm Oxide Deposition: Manufactured in 2007; Status: Bagged and Skidded 3 Chamber system
	195981	Applied Materials	Applied Materials	Quantum XP	Ion Implanters in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Quantum XP, High Current Ion Implanter, 300mm: Applied Materials, Quantum XP,  High Current Ion Implanter, 300mm !!!Multiple Units Available.  Please inquire !!!
	201136	Applied Materials In	Applied Materials In	Reflexion FA	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Reflexion FZ, 300mm, CMP: Applied Materials, Reflexion FZ, 300mm, CMP S/N : 407717
	201137	Applied Materials In	Applied Materials In	Reflexion LK	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Reflexion LK, 300mm, CMP: Applied Materials, Reflexion LK, 300mm, CMP, Cu Polish  S/N : 408723
	201138	Applied Materials In	Applied Materials In	Reflexion LK	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Reflexion LK, 300mm, CMP: Applied Materials, Reflexion LK, 300mm, CMP S/N : 408732
	199968	Semitool	Semitool	RAIDER sp312	Wet Process Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Santa Clara, California, United States
Applied Materials, Semitool, Raider SP312, Bevel Edge Clean, 300mm: Applied Materials, Semitool, Raider SP312, Bevel Edge Clean, 300mm Cold Shutdown,  In the FAB. Non Working Condition =>  WIP controller (PC) is faulty and upgrade required. Chamber of CP7, CP8 (PEC) are currently not functionally with alarm: spin amplifier failure. Filter housing and bracket for T1 (HF49%) are missing parts as parts are corroded and damaged. S/N: T239001
	178310	AMAT	AMAT	Uvision 200	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire		Taichung, Taichung City, Taiwan
Applied Materials, Uvision 200, Bright Field Inspection, 300mm: Manufactured in 2005; Status: Bagged and Skidded
	201133	Applied Materials	Applied Materials	Vantage	Single Chamber RTP Tools in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Vantage, Vulcan, RTP, 300mm : Applied Materials, Vantage,  Vulcan, Spike RTP, 300mm  2 Chamber System S/N : 426995
	201134	Applied Materials	Applied Materials	Vantage Vulcan	Single Chamber RTP Tools in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
Applied Materials, Vantage, Vulcan, RTP, 300mm : Applied Materials, Vantage, Vulcan, RTP, 300mm  2 Chamber System S/N : 429402
	201736	Applied Materials	Applied Materials	VeritySEM 5i	Critical Dimension Scanning Electron Microscopes in Microscopes, Optical Inspection	1		Inquire		Albany, New York, United States
Applied Materials, Verity SEM 5i, CD SEM, 300mm: Applied Materials, Verity SEM 5i, CD SEM, 300mm Installed.  Working
	183418	ASM	ASM	A412 Dual Reactor	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Malta, New York, United States
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN: ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2561 Serial Number: 2E0071-00-01 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage   Tool ID: FVX2561
	183417	ASM	ASM	A412 Dual Reactor	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Malta, New York, United States
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN: ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2560 Serial Number: 2E0061-00-01 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage   Tool ID: FVX2560
	183169	ASM	ASM	A412	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Malta, New York, United States
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN: ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN Twin LPCVD SiN Reactors TOOL ID: FVX2541 Serial Number: 2E0082 2011 Vintage
	183170	ASM	ASM	A412	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Malta, New York, United States
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN: ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN Twin LPCVD SiN Reactors TOOL ID: FVX2540 Serial Number : 2E0066 2011 Vintage   Tool ID: FVX2540
	196930	ASM	ASM	A300 VT	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Burlington, Vermont, United States
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation: ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation Cold shutdown Vintage 1997 S/N: 71F5669AE
	196931	ASM	ASM	A300 VT	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Burlington, Vermont, United States
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation: ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation S/N: 71F5669AC
	196932	ASM	ASM	A300 VT	Vertical LPCVD Furnaces in Chemical Vapor Deposition Equipment	1		Inquire	F*	Burlington, Vermont, United States
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation: ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation Cold, Shutdown S/N: 71F5669AE
	201749	ASM	ASM	E3200	Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment	1		Inquire		Dresden, Saxony, Germany
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System: ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System E3200 RP left hand S/N : 34060   In the fab.  Cold idle.
	201750	ASM	ASM	E3200	Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment	1		Inquire		Dresden, Saxony, Germany
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System E3200 RP: ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System S/N : 034100   In the Fab.  Cold idle.
	202506	ASM	ASM	P8300 Polygon	Single Chamber RTP Tools in Wafer Fabrication Equipment	1		Inquire		Dresden, Saxony, Germany
ASM, Polygon, P8300, 300mm Multi Chamber Platform, Platform Only: ASM, Polygon, P8300, 300mm Multi Chamber Platform, Platform Only   S/N : 1E-834500-01   DOM : August 2010
	196827	ASML	ASML	AT 850	Optical Inspection - Other in Microscopes, Optical Inspection	1		Inquire		East Fishkill, New York, United States
ASML AT-850, 300mm, KrF 248nm Scanner:   ASML AT-850D, 300mm, KrF 248nm Scanner,  S/N : m5946 Known Tool Issues: Currently power off with Lens gas flowing, tool had issue with illumination rack that will require replacement.  The tool currently has all of the parts present, but they have not necessarily been calibrated or setup with the tool being off.  Laser has 104.5 Billion pulses on it.  Components were good when shutdown. The Beam steering hardware in not functional, and the ACC needs an heat exchanger installed   Tool ID: GB03
	201146	ASML	ASML	PAS5500 /100D	I-Line Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
ASML PAS 5500 - /100D, iLine Stepper, 200mm: ASML PAS 5500 - /100D, iLine Stepper, 200mm onLine S/N : 8846
	201148	ASML	ASML	PAS5500 /100D	I-Line Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
ASML PAS 5500 - /100D, iLine Stepper, 200mm: ASML PAS 5500 - /100D, iLine Stepper, 200mm S/N : 8550 OnLine in the Fab
	201147	ASML	ASML	PAS5500 /100D	I-Line Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
ASML PAS 5500/1100, 200mm, 193nm, Scanner: ASML PAS 5500/1100, 200mm, 193nm, Scanner S/N : 8217  NOTE: Serial Number on the Configuration is incorrect.  Deinstalled Dec 2016
	199718	ASML	ASML	PAS5500 /1100	Deep UV Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Burlington, Vermont, United States
ASML PAS 5500/1100, 200mm, 193nm, Scanner: ASML 193nm 5500/1100 Scanner
	192588	Asymtek	Asymtek	S-800	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Malta, New York, United States
ASYMTEK, S-800, Adhesive Dispense Tool, : NORDSON ASYMTEK, S-820B, Adhesive Dispense Tool,  S-820B Specification and Facility Requirements Motion System: Type: Brushless DC servo motors, closed-loop with encoder feedback Encoder Resolution: 10 micrometer Positional Accuracy: ±0.075 mm (0.003 in.), 3 sigma Placement Accuracy: ±0.100 mm (0.004 in.), 3 sigma X-Y Acceleration: 0.25 g peak with S-curve jerk control X-Y Velocity: 500 mm/s (20 in./s) Z-Axis Velocity: 500 mm/s (20 in./s) X-Y Repeatability: ±0.025 mm (0.001 in.) Z-Axis Repeatability: ±0.025 mm (0.001 in.) Dispense Area: Work Envelope: 350 x 350 mm (14 x 14 in.) Z-Travel: 75 mm Tool Payload: 3 kg Workpiece Payload: 2 kg Vision and Lighting: Vision: Vision system with Automatic Pattern Recognition Lighting: Programmable, on-axis, red/blue LED, 256 steps Computer: Computer: Windows-based PC User interface: Color LCD flat-panel display; ASCII keyboard & pointing device; Ethernet network port Software: User Environment: Fluidmove® Operating System: Windows® Dimensions: See dimensional drawings on next page. Facility Requirements: System Footprint: 866 mm wide X 1123 mm deep (34 x 44 in.) Display extends unit 610 mm (24 in.) Height including light beacon: 2045 mm Air Supply: 621 kPa (6.1 atm, 90 psi) 3 CFM @ 90 psi (28 liters/hr = 1 SCFM) (May be higher depending upon application) Power (Mains): 200/240 VAC, 8.5 Amps (max), 50/60 Hz, Single Phase Weight: 364 kg (800 lbs)
	185298	Autoclean	Autoclean	ISG-2000	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire		Singapore, Singapore
Autoclean, ISG-2000, Ultrasonic Cleaner: Autoclean, ISG-2000, Ultrasonic Cleaner
	183772	Axcelis Technologies	Axcelis Technologies	Compact II	Clean Room Ovens in Wafer Fabrication Equipment	1		Inquire	F*	Dresden, SN, Germany
Axcelis Compact II, 300mm, H2 Reflow Furnace, : Axcelis Compact II, 300mm, H2 Reflow Furnace, C4 Processing. Tool ID: OVN222 Serial Number :  H08046
	178965	Axcelis Technologies	Axcelis Technologies	Optima HDxT	Ion Implanters in Wafer Fabrication Equipment	1		Inquire	F*	Malta, NY, United States
Axcelis Optima HDxT, Ion Implanter, 300mm, : 300mm ion implanter, spare beam tunnel, SRA, PFG, source, manipulator, bushing source flange adapter, source turbo exhaust line, and . chamber liners. Axcelis Optima HDxT   Roughing Pumps: Edwards IGX100L Edwards iGX100M Edwards iGX600M   Cryo Pumps: Qty (2) Brooks: 320FE Qty (1) Brooks: 250FE   Turbo Pump TP1: Edwards STP-XA2703CV TP2: Edwards STP-A1303CV   Chillers:  Affinity J Chiller Model: GWN-ZRMK-BE55CBS6 Affinity F-Series Model: FWA-032K-DD19CBD4   Cryo Compressors: Qty (2) Brooks: IS-1000
	201122	Axcelis Technologies	Axcelis Technologies	GSD 200E2	Ion Implanters in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Axcelis, GSD200E2 180keV, 200mm, High Current Ion Implanter: Axcelis, GSD200E2 180keV, 200mm, High Current Ion Implanter S/N : 454
	201648	Axcelis/Fusion	Axcelis/Fusion	RapidCure 320 PS	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Singapore, Singapore
Axcelis, RapidCure 320 PS, 300mm, Photo Resist Stabilizer , 300mm: Axcelis, RapidCure 320 PS, 300mm, Photo Resist Stabilizer  S/N : RPC320014UT In the fab, production
	198239	AXIDEN	AXIDEN	APR 4300 Pod Regenerator	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
AXIDEN, APR 4300, 300mm Pod Regenerator: AXIDEN,  APR 4300, 300mm Pod Regenerator
	181816	Blue M	Blue M	DCC-1406CY	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Singapore, Singapore
Blue M Electric Oven, DCC-1406CY: Blue M Electric Oven,  DCC-1406CY Tool ID: OVEN-01 (PEA106)
	183762	Blue M	Blue M	DDC-206CY	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Singapore, Singapore
Blue M Electric Oven, DCC-206CY, 200mm, oven: Blue M Electric Oven,  DCC-206CY, 200mm, oven Tool ID : OVEN-01 (PEA052)
	196206	Blue M	Blue M	DCC-206-EV-ST350	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Santa Clara, California, United States
Blue M Oven, DCC-206-EV-ST350, 200mm, Resist Bake: Blue M Oven, DCC-206-EV-ST350, 200mm, Resist Bake S/N :DCC-832 MULTIPLE UNITS AVAILABLE!!  Please inquire
	192687	Blue M	Blue M	LO-90-P	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Malta, New York, United States
BLUEM, TPS, LO-90-P, Atmospheric Oven: BLUEM, TPS, LO-90-P, Oven Atmospheric oven capable of 260°C 120V 1500W
	178423	Branson	Branson	5210DTH	Ultrasonic Baths in Laboratory Equipment	1		Inquire	F*	Taichung, Taichung City, Taiwan
Branson/ICP, 5210DTH Ultrasonic Cleaner, 300mm: Status: Bagged and Skidded
	192501	Brewer Science	Brewer Science	300x	I-Line Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
Brewer Science, 300 X, Resist Coater/Developer, 300mm: Brewer Science,  300 X, Resist Coater/Developer, 300mm Resist Coater
	192500	Brewer Science	Brewer Science	CEE 2000 FX	I-Line Wafer Stepper in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
Brewer Science, CEE 200 FX, Resist Coater, 300mm: Brewer Science, CEE 200 FX, Resist Coater, 300mm photoresist coater
	192585	Brewer Science	Brewer Science	CEE 200 FX	Manual Photoresist Coaters in Wafer Fabrication Equipment	1		Inquire		Malta, New York, United States
Brewer Science, CEE 200 FX, Resist Developer, 300mm: Brewer Science,  CEE 200 FX, Resist Developer, 300mm Configured for 300mm Square substrates S/N: 2101071
	192696	Brookfield	Brookfield	DV2THCBCO	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Malta, New York, United States
Brookfield, DV2THCBCO, Viscometer: Brookfield, DV2THCBCO, Viscometer Viscometer measures fluid viscosity at given shear rates
	201532	Brooks	Brooks	Zaris	Materials Handling Equipment - Other in Wafer Fabrication Equipment	1		Inquire		Taichung, Taichung City, Taiwan
Brooks, Zaris, 300mm, Mask Cleaner : Brooks, Zaris, 300mm, Mask Cleaner  In Warehouse  S/N : 0504-10350
	200225	Bruker	Bruker	D8 Diffractometer	Xray Diffractometers in Metrology Equipment	1		Inquire		East Fishkill, New York, United States
Bruker, D8, Diffractometer, 300mm, X-Ray Metrology: Bruker, D8, Diffractometer, 300mm, X-Ray Metrology S/N: 203956
	199447	Bruker, D8FABLINE, 300mm, X-Ray Metrology	Bruker, D8FABLINE, 300mm, X-Ray Metrology		Microscope Inspection Items - Other in Microscopes, Optical Inspection	1		Inquire		East Fishkill, New York, United States
Bruker, D8FABLINE, 300mm, X-Ray Metrology: Bruker, D8FABLINE, 300mm, X-Ray Metrology S/N 204500 2009  The tool is an automated High resolution X-ray diffractometer, clean room (class 1 US-FED-STD 209 or Class 2 ISO 14644-1) compatible, with full 300 mm wafer mapping capabilities. The D8 FABLINE consists of two stainless steal cabinets attached to each other. The first one is an X-ray analytical module composed of: radiation safe enclosure, vertical D8 goniometer, UMC 300mm wafer stage and dedicated optical set-ups, and all required supplies. The second is a handling module Equipment Front End Module (EFEM) Bridge tool Startan from Asyst.The wafers are carried either in FOUP (Front Opening Unified Pod) for 300mm or in FOUP insert for 200mm..
	195987	Bruker, D8FABLINE, 300mm, X-Ray Metrology	Bruker, D8FABLINE, 300mm, X-Ray Metrology		Microscope Inspection Items - Other in Microscopes, Optical Inspection	1		Inquire		Singapore, Singapore
Bruker, D8FABLINE, 300mm, X-Ray Metrology: Bruker, D8FABLINE, 300mm, X-Ray Metrology
	199780	BTU, Ovens / Furnaces, 200mm, Controlled Atmosphere Furnace	BTU, Ovens / Furnaces, 200mm, Controlled Atmosphere Furnace		Clean Room Ovens in Wafer Fabrication Equipment	1		Inquire	F*	Burlington, Vermont, United States
BTU, Ovens / Furnaces, 200mm, Controlled Atmosphere Furnace: BTU, Ovens / Furnaces, 200mm, Controlled Atmosphere Furnace S/N: IBVT-1
	201848	Cameca	Cameca	IMS-6F	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire	F*	East Fishkill, New York, United States
Cameca, IMS-6F, SIMS: Cameca, IMS-6F, SIMS Secondary Ion Mass Spectroscopy   S/N : 657   Warm Idle   DOM: 1998
	201849	Cameca	Cameca	IMS-7F	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire	F*	East Fishkill, New York, United States
Cameca, IMS-7F, SIMS: Cameca, IMS-7F, SIMS   Secondary Ion Mass Spectroscopy   S/N: 807
	195984	Cameca	Cameca	LEXFAB300	Scientific and Laboratory Equipment - Other in Metrology Equipment	1		Inquire		Dresden, Saxony, Germany
CAMECA, LEXFAB300, 300mm, Diffusion Measurement: CAMECA, LEXFAB300, 300mm, Diffusion Measurement
	194728	Canon Anelva	Canon Anelva	C5100GT	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire	F*	Dresden, Saxony, Germany
Canon Anelva, C-5100GT, 300mm PVD, Gate Last Metal Deposition System: Canon Anelva, C-5100GT, 300mm PVD, Gate Last Metal Deposition System S/N : EVP-55608 DOM : 2010   This is a PVD (Physical Vapor Deposition) system for high-quality metal or metal compound deposition with greater efficiency, reliability and lower cost of ownership. This system is comprised of two [2] PCM-Xs modules, two [2] PCM-X modules, one [1] Degas module, one [1] wafer transfer module with one [1] Aligner module, two [2] loadlock modules and EFEM with one [1] aligner and three [3] load ports. This system processes 300mm SEMI notch wafers.
	192338	Canon Anelva	Canon Anelva	C-7100GT	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire	F*	Dresden, Saxony, Germany
Canon Anelva, C-7100GT, 300mm PVD, Gate Metal Deposition System: Canon Anelva, C-7100GT, 300mm PVD, Gate Metal Deposition System S/N : EVP-52041 DOM : 2007 This is a PVD (Physical Vapor Deposition) system for high-quality metal or metal compound deposition with greater efficiency, reliability and lower cost of ownership. This system is comprised of two [2] 2PVD-EX modules, three [3] PCM-X modules, one [1] Degas module, one [1] 4/5PVD-EX module, two [2] wafer transfer modules with one [1] Pass module with one [1] aligner, two [2] loadlock modules and EFEM with one [1] aligner and two [2] load ports. This system processes 300mm SEMI notch wafer.
	199378	Canon Anelva	Canon Anelva	C-7100GT	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire		East Fishkill, New York, United States
Canon Anelva, C-7100GT, 300mm PVD, Gate Metal Deposition System: Canon Anelva, C-7100GT, 300mm PVD, Gate Metal Deposition System
	192942	Carl Zeiss	Carl Zeiss	MeRit MG65	Wafer Production Equipment - Other in Wafer Fabrication Equipment	1		Inquire	F*	Burlington, Vermont, United States
Carl Zeiss, MeRit MG65 Plus, Mask Repair, e-beam, : Carl Zeiss, MeRit MG65 Plus, Mask Repair, e-beam,  S/N : 41112000010109 DOM : June 2007
	182727	Control Air	Control Air	D-9-L-SM-UM-MOD 184	Other Items and Mixed Lots in Chambers, Components, Accessories and Other Items	1		Inquire	F*	Burlington, VT, United States
CFM 8100 OMNI, Air Lift Spares, Diaphragm Air Cylinder, : Spare Parts - CFM 1800,  CFM OMNI, Diaphragm Air Cylinders New Old Stock, Original Packaging Lot of 20. D-9-L-SM-UM LIFT,MODEL#184 TEST PSI.=100 PSI,DECAY = 0 PSI/ # OF CYCLES =5
	199711	Chiron	Chiron	XACT830A	Failure Analysis Test Instruments in Automatic Test Equipment	1		Inquire		Dresden, Saxony, Germany
Chiron Technology, XACT830A, Rel Test System, Package level: Chiron Technology, XACT830A, Rel Test System, Package level Cold, Off Line. In REL Test area.
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