Your reliable source for surplus semiconductor equipment!
	more...

SPECIALS LISTINGS

About Us Contact Us

Serving  Our Guest Log in    Register to manage deal making

Featured New Additions:

For full details, click on picture or More Info button.

Added    Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   Oct 5 235046 LAM Research Corp.   LAM Research Corp.   Veeco Summit chm  Clean Room Equipment in Chambers, Components, Accessories and Other Items LAM, Veeco Summit chm, for MRAM, 300mm, S/N 9903-890-01 IBE C-1: LAM, Veeco Summit chm, for MRAM, 300mm, S/N 9903-890-01 IBE C-1 1 Inquire N* Singapore, Singapore Oct 5 235045 Applied Materials   Applied Materials   Nanosem 3D  Scanning Electron Microscopes in Microscopes, Optical Inspection AMAT, Nanosem 3D, 300mm, S/N U648: AMAT, Nanosem 3D, 300mm, S/N U648 1 Inquire N* East Fishkill, New York, United States Sep 28 234789 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Fabrication Equipment Nikon, NSR-S208D, 300mm, S/N 8732069: Nikon, NSR-S208D, 300mm, S/N 8732069 1 Inquire N* Singapore, Singapore Sep 27 234773 Nikon   Nikon   NSR-S208D  Deep UV Wafer Stepper in Wafer Fabrication Equipment Nikon, NSR-S208D, 300mm, S/N 8732008: Nikon, NSR-S208D, 300mm, S/N 8732008 1 Inquire N* Singapore, Singapore Sep 23 234539 Nikon   Nikon   S204B  Deep UV Wafer Stepper in Wafer Fabrication Equipment Nikon, S204B, 200mm, S/N 6030134: Nikon, S204B, 200mm, S/N 6030134 X92V Lens Data: Distortion =  0.015 µm IU Flare = 1.80% Lens Flare = 9.0% Uniformity = 5.3% Power = 779 mW Total Focus Deviation = 0.202 µm  Astigmatism = 0.081 µm  Coma = 0.062 µm Iso DOF = N/A µm (>35nm of CD Range at Best Focus) 1 Inquire N* Burlington, Vermont, United States

*  Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.