 |
Item ID |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
| Make |
Model |
| |
|
$ |
|
 |
195174
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
 |
Dresden, Saxony, Germany |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System Epsilon 3200, Epitaxial Reactor In the fab. • Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)
|
|
195647
|
ASM |
Epsilon 3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
|
Dresden, Saxony, Germany |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200 Reduced Pressure, 300mm, Epi Deposition SystemEpsilon 3200, Epitaxial Reactor
In the fab.
• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)
|
|
199194
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
|
Dresden, Saxony, Germany |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200, 300mm, Epi Deposition System
Left Handed Reduced PressureFRONT END INTERFACE
Load Ports (Qty. 2) ISOPORT
FOUP ID Reader (RF), Qty. 2
Side Louvered Panels/Flat Top (Ballroom Configuration)
Light Tower - 4 position (STD)
Installation (2 per system):
Door Mounted on Wafer Transfer Module (Std)
FEI Mount (for Ballroom configuration)
Dual 25 wafer Loadlock
Vacuum Load Locks
Level 2
(VLL configured for two pumps: one dedicated
to LL#1 and LL #2 and one for WHC)
REACTOR MODULE
HCI Detector- Reactor
TEK Gases (Unit/Clerity 8161 digital0
N2
H2 - 100slm
HCl - 30slm
B2H6 - 20/200/200
As3/Ph3 - 20/200/200
DCS - 500sccm
SiH4 - 500sccm
GeH4 - 200sccm
Bottom Services
|
|
199195
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
|
Dresden, Saxony, Germany |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200, 300mm, Epi Deposition System
Warm Idle
S/N: 034040
Right Handed System
|
|
199718
|
ASML |
PAS5500 /1100 |
in Wafer Fabrication Equipment
|
1
|
|
Inquire |
N* |
Burlington, Vermont, United States |
|
ASML PAS 5500/1100, 200mm, 193nm, Scanner:ASML 193nm 5500/1100 Scanner
|
|
196827
|
ASML |
AT 850 |
in Microscopes, Optical Inspection
|
1
|
|
Inquire |
|
East Fishkill, New York, United States |
|
ASML AT-850, 300mm, KrF 248nm Scanner: ASML AT-850D, 300mm, KrF 248nm Scanner, S/N : m5946 Known Tool Issues:
Currently power off with Lens gas flowing, tool had issue with illumination rack that will require replacement. The tool currently has all of the parts present, but they have not necessarily been calibrated or setup with the tool being off. Laser has 104.5 Billion pulses on it. Components were good when shutdown.
The Beam steering hardware in not functional, and the ACC needs an heat exchanger installed Tool ID: GB03
|
|
197858
|
ASML |
TWINSCAN XT:850F |
in Microscopes, Optical Inspection
|
1
|
|
Inquire |
|
Veldhoven, North Brabant, Netherlands |
|
ASML, XT: 850F, 300mm, KrF, :ASML, TWINSCAN XT:850F, 300mm, KrF, S/N: m7691 Laser model CYMER ELS-7610K (40W)
MES machine type XT850F
OIU/Reticle-/Waf.aux.port Right Configuration
Power 400 Volt
In warehouse stored.
|
|
183169
|
ASM |
A412 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Malta, NY, United States |
|
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN Twin LPCVD SiN Reactors TOOL ID: FVX2541 2011 Vintage
|
|
183170
|
ASM |
A412 |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Malta, New York, United States |
|
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors
TOOL ID: FVX2540
2011 Vintage Tool ID: FVX2541
|
|
183417
|
ASM |
A412 Dual Reactor |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Malta, New York, United States |
|
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2560 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage Tool ID: FVX2560
|
|
183418
|
ASM |
A412 Dual Reactor |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Malta, New York, United States |
|
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2561 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage Tool ID: FVX2561
|
|
196930
|
ASM |
A300 VT |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Burlington, Vermont, United States |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation Cold shutdown Vintage 1997 S/N: 71F5669AE
|
|
196931
|
ASM |
A300 VT |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Burlington, Vermont, United States |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation S/N: 71F5669AC
|
|
196932
|
ASM |
A300 VT |
in Chemical Vapor Deposition Equipment
|
1
|
|
Inquire |
F* |
Burlington, Vermont, United States |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation Cold, Shutdown S/N: 71F5669AE
|
|
|
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