|  | Item ID | Photo | Item Description | Description | Condition | # | Price | Notes | Location |
---|
Make | Model |
---|
| | | | | | | | $ | | |
 |
178357
|
| AMAT | Centura | | |
1
|  |
Inquire |
F* |
Malta, New York, United States |
 |
226869
|
| Applied Materials | Centura | 4 Chamber Etch tool with CHA= Minos, CHB = Mino... | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
227058
|
| Applied Materials | Centura | 4 chamber Etch tool, CHA = Minos, CHB = Minos, ... | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
202929
|
| Applied Materials | Centura Enabler | Oxide Etch | |
1
|  |
Inquire |
 |
Dresden, Saxony, Germany |
 |
224154
|
| Canon | C-7100GT | CANON ANELVA, Al, Ti, and La PVD | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
204280
|
| Hitachi | M-8190XT | Dielectric Etch (spacer) | |
1
|  |
Inquire |
 |
Malta, New York, United States |
 |
227880
|
| LAM | 2300 v2 | Lam 2300 v2 Etch platform with 4 Lam Exelan Cha... | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
227585
|
| LAM | INOVA XT | Cu and CuMn deposition | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
219677
|
| LAM Research Corp. | INOVA | Cu Barrier Seed depostion | |
1
|  |
Inquire |
 |
Malta, New York, United States |
 |
199312
|
| Shibaura | Allegro CDE-300 | Dry Chemical Etch | |
1
|  |
Inquire |
 |
East Fishkill, New York, United States |
 |
204306
|
| Tokyo Electron Ltd | Certas LEAGA | Single wafer Dry Cleaning System | |
1
|  |
Inquire |
 |
Malta, New York, United States |
 |
201830
|
| Tokyo Electron Ltd | Telius SP 305 SCCM | Dielectric Etch (contact) | |
1
|  |
Inquire |
 |
Busan, Busan, South Korea |
 |
233202
|
| Tokyo Electron Ltd | UNITY M SCCM | Plasma Etcher | |
1
|  |
Inquire |
N* |
Burlington, Vermont, United States |
NOTE:
photo available
reference document attached
F* if the item is specially featured
N* if the item is newly added, and/or
R* if the item's price is recently reduced.
|
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