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Mattson, Steag, TiW Wet Etch Tool, 300mm,
TiW Wet Etch Tool, Steag, Mattson, 300mm
This tool had two heated TiW Etch tanks, with a quick dump rinse and hot run rinse per tank. It also has two nitrogen dryers. It chemically etched wafers with an active peroxide solution and used a impedance measurement across the wafer to verify etch endpoint was reached. The tool was automated to take wafers out of FOUPs and load them into etch racks which were then each moved through a series of tanks. Data collection and SECS GEM is available. *Tool configuration/specification details. (Potential sources are original quotes, configuration
Tool ID: TiW01
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