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Your search for Manufacturer: Applied Materials, Inc
found:
  • 21 Listing(s) with a matching description:
 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
178246
AMAT  

AMAT  

Ultima X 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1 Inquire Taichung, Taichung City, Taiwan
Applied Materials, HDP CVD, 300mm Oxide Deposition:
Manufactured in 2007; Status: Bagged and Skidded 3 Chamber system
180474
Applied Materials  

Applied Materials  

NanoSEM 3D 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire F* East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM:

MULTIPLE UNITS AVAILBLE.  PLEASE INQUIRE.


SEM - Critical Dimension (CD) Measurement

Currently configured for 300mm wafers

CE Marked

Install Type: Stand Alone

Cassette Interface:

• (3) 300mm FOUP

Roll-Around Ergo-Station w/Touch-Screen

Status Lamp

Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8)

Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz

 

Software Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8

180514
Applied Materials  

Applied Materials  

NanoSEM 3D 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire F* East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM:

Applied Materials NanoSEM 3D, 300mm wafers, CD SEM

MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE.


SEM - Critical Dimension (CD) Measurement

Currently configured for 300mm wafers

CE Marked

Install Type: Stand Alone

Cassette Interface:

• (3) 300mm FOUP

Roll-Around Ergo-Station w/Touch-Screen

Status Lamp

Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8)

Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz

 

Software Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8

 

Tool ID: KA03

201736
Applied Materials  

Applied Materials  

VeritySEM 5i 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire Albany, New York, United States
Applied Materials, Verity SEM 5i, CD SEM, 300mm:

Applied Materials, Verity SEM 5i, CD SEM, 300mm

Installed.  Working

195981
Applied Materials  

Applied Materials  

Quantum XP 

List all items of this typeIon Implanters

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Quantum XP, High Current Ion Implanter, 300mm:
Applied Materials, Quantum XP,  High Current Ion Implanter, 300mm

!!!Multiple Units Available.  Please inquire !!!
178309
AMAT  

AMAT  

Complus 

List all items of this typeOptical Inspection - Other

in Microscopes, Optical Inspection

1 Inquire Singapore, Singapore
Applied Materials, Complus, Particle Measurement, 300mm:
Manufactured in 2007; Status: Bagged and Skidded

MULTIPLE UNITS AVAILALBE!!! Please inquire.
178310
AMAT  

AMAT  

Uvision 200 

List all items of this typeOptical Inspection - Other

in Microscopes, Optical Inspection

1 Inquire Taichung, Taichung City, Taiwan
Applied Materials, Uvision 200, Bright Field Inspection, 300mm:
Manufactured in 2005; Status: Bagged and Skidded
178356
AMAT  

AMAT  

Centura AP, AdvantEdge G5  

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, SN, Germany
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch:
Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260
178357
AMAT  

AMAT  

Centura 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire F* Malta, NY, United States
Applied Materials, Etch, Centura Carina Chamber 300mm:
Tool ID : ETX2291-c

Chamber Only.
Carina Etch Chamber.
 Chamber Materials: ADVANCED CERAMIC
Lid Materials:  AG 1000
Process Ring: QUARTZ SINGLE RING
Plasma Exposed Chamber Oring: KALREZ
Cathode Temperature Range: 130 TO 250C
Carina Etch Swap Kit: 1
Chamber Viewport: STANDARD VIEWPORT
Endpoint Type: EyeD IEP
CCM Cover: NO



Location is Malta, NY.
182387
Applied Materials  

Applied Materials  

Enabler, Centura, 4 Chamber Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, AMAT, Enabler, Centura, 300mm Etch, :
Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch  

MULTIPLE UNITS AVAILABLE:  Please inquire.
182414
Applied Materials  

Applied Materials  

Centura Enabler - Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, AMAT, Enabler, Centura, 300mm Etch:

Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

STATUS:  Cold Idle, Cleaned

Dry Etch Applidations: MA, MB, KA, LT, 300mm wafers, 32nm TEOS Etch    

Gases: C4F6, CO,CH2F2,H2,N2,O2, Ar, CF4,CHF3, CO2, NH3


MUL

 

Tool ID: ETX659

 
193144
Applied Materials  

Applied Materials  

Centura Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Centura Etch, 300mm, :
Applied Materials, Centura Etch, 300mm, 

Centura AP Platform

Chambers : 2 x Minos, 1 x Carina, 1 x Axion

S/N : 423383


199313
Applied Materials  

Applied Materials  

Centura Etch, DPS Minos 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire East Fishkill, New York, United States
Applied Materials, Centura Etch, DPS Minos, 300mm:
Applied Materials, Centura Etch, DPS Minos,  300mm
199767
Applied Materials  

Applied Materials  

Producer-eXT 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Singapore, Singapore
Applied Materials Producer-eXT, ETCH, 300mm, :
Applied Materials Producer-eXT, ETCH, 300mm, 

S/N: 414698
195983
Applied Materials  

Applied Materials  

Elite MS MC 

List all items of this typeScanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire Dresden, Saxony, Germany
Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection:
Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection

iii Multiple Units Available.  Please inquire !!!
201129
Applied Materials  

Applied Materials  

SemvisionG3 

List all items of this typeScanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire Dresden, Saxony, Germany
SEMVision G3, Applied Materials, 300mm, Defect Review System:

SEMVision G3, Applied Materials, 300mm, Defect Review System

S/N : W-5002

201133
Applied Materials  

Applied Materials  

Vantage 

List all items of this typeSingle Chamber RTP Tools

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Vantage, Vulcan, RTP, 300mm :
Applied Materials, Vantage,  Vulcan, Spike RTP, 300mm 
2 Chamber System

S/N : 426995
201134
Applied Materials  

Applied Materials  

Vantage Vulcan 

List all items of this typeSingle Chamber RTP Tools

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Vantage, Vulcan, RTP, 300mm :
Applied Materials, Vantage, Vulcan, RTP, 300mm 
2 Chamber System

S/N : 429402
199193
Applied Materials  

Applied Materials  

Reflexion 

List all items of this typeWafer Production Equipment - Other

in Wafer Fabrication Equipment

1 Inquire F* East Fishkill, New York, United States
Applied Materials Reflexion, 300mm, CMP:

Applied Materials Reflexion  300mm CMP

S/N: S118

DOM : 2001 


201130
Applied Materials  

Applied Materials  

Endura 5500 

List all items of this typeWafer Production Equipment - Other

in Wafer Fabrication Equipment

1 Inquire Singapore, Singapore
Applied Materials, Endura 5500, PVD, 200mm:

Applied Materials, Endura 5500, PVD, 200mm

Multi-Chamber Sputtering System, ImpTa, Clamp Alu, PCII

S / N : 21117

MISSING PARTS !!!

201131
Applied Materials  

Applied Materials  

Centura XE+ 

List all items of this typeWafer Production Equipment - Other

in Wafer Fabrication Equipment

1 Inquire Singapore, Singapore
Applied Materials, Centura, RTP XE+, 200mm:
Applied Materials, Centura, RTP XE, 200mm<br /><br />TPCC Mainframe,<br /><br />3 Chamber XE+ ;<br /><br />S/N : ;304142

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.