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FULL DESCRIPTION of Item 195174

in Other Chemical Vapor Deposition Equipment
Item ID: 195174

Offered1 Offered Inquire


ASM, E3200, 300mm, Epi Deposition System

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System
Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

Tool ID: EPI100



Location: Dresden, Saxony, Germany
Unit Price Inquire
Number of Units 1
Manufacturer ASM
Model E3200
Description Epsilon 3200, Epitaxial Reactor

Shipping & Handling:

All freight cost estimates are for dock to dock service only.
Any additional services, i.e. lift-gate, inside or residential delivery, must be requested at the time of sale and will be billed accordingly.
GLOBALFOUNDRIES is not responsible for any damage incurred during shipment. It is the buyer's responsibility to inspect packages for damage and to note any damage on bill of lading.
 
Payment:

All other sales, including foreign sales, are prepayment only.
MasterCard, VISA, Discover and AMEX are accepted at sellers discretion.