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Your search for Manufacturer: Applied Materials, Inc
found:
  • 18 individual listing(s) with a matching description:
 Offered (box) or Wanted (coins)  Item ID  Short Description Product Type / Details # Price Notes Location
Make Model
  $  
198214

Applied Materials  

Centura WxZ 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1 Inquire N* Singapore, Singapore
Applied Materials, Centura WxZ CVD, Standard, 200mm:
Applied Materials, Centura WxZ CVD, Standard, 200mm

Major Parts Missing.

Bagged & Skidded in Warehouse

S/N: 306010
180474

Applied Materials  

NanoSEM 3D 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire F* East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM:

MULTIPLE UNITS AVAILBLE.  PLEASE INQUIRE.


SEM - Critical Dimension (CD) Measurement

Currently configured for 300mm wafers

CE Marked

Install Type: Stand Alone

Cassette Interface:

• (3) 300mm FOUP

Roll-Around Ergo-Station w/Touch-Screen

Status Lamp

Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8)

Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz

 

Software Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8

180514

Applied Materials  

NanoSEM 3D 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire F* East Fishkill, NY, United States
Applied Materials NanoSEM 3D, 300mm wafers, CD SEM:

Applied Materials NanoSEM 3D, 300mm wafers, CD SEM

MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE.


SEM - Critical Dimension (CD) Measurement

Currently configured for 300mm wafers

CE Marked

Install Type: Stand Alone

Cassette Interface:

• (3) 300mm FOUP

Roll-Around Ergo-Station w/Touch-Screen

Status Lamp

Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8)

Power Requirements: V 120/208, 8A, Single Phase / 3-Phase, 5-Wire, Freq 50/60Hz

 

Software Options:

• Slope Reconstruction

• CH Analysis

• Profile Grade

• Discrete Inspection

• Defect Review

• ARAMS (ES8

 

Tool ID: KA03

189511

Applied Materials  

Semvision CX 

List all items of this typeCritical Dimension Scanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire F* Burlington, Vermont, United States
Applied Materials, SEMVision CX, 200mm, :
Applied Materials, SEMVision CX, 200mm,

Serial Number is W854.
195981

Applied Materials  

Quantum XP 

List all items of this typeIon Implanters

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Quantum XP, High Current Ion Implanter, 300mm:
Applied Materials, Quantum XP,  High Current Ion Implanter, 300mm

!!!Multiple Units Available.  Please inquire !!!
178309

AMAT  

Complus 

List all items of this typeOptical Inspection - Other

in Microscopes, Optical Inspection

1 Inquire Singapore, Singapore
Applied Materials, Complus, Particle Measurement, 300mm:
Manufactured in 2007; Status: Bagged and Skidded

MULTIPLE UNITS AVAILALBE!!! Please inquire.
178310

AMAT  

Uvision 200 

List all items of this typeOptical Inspection - Other

in Microscopes, Optical Inspection

1 Inquire Taichung, Taichung City, Taiwan
Applied Materials, Uvision 200, Bright Field Inspection, 300mm:
Manufactured in 2005; Status: Bagged and Skidded
178356

AMAT  

Centura AP, AdvantEdge G5  

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, SN, Germany
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch:
Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260
178357

AMAT  

Centura 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire F* Malta, NY, United States
Applied Materials, Etch, Centura Carina Chamber 300mm:
Tool ID : ETX2291-c

Chamber Only.
Carina Etch Chamber.
 Chamber Materials: ADVANCED CERAMIC
Lid Materials:  AG 1000
Process Ring: QUARTZ SINGLE RING
Plasma Exposed Chamber Oring: KALREZ
Cathode Temperature Range: 130 TO 250C
Carina Etch Swap Kit: 1
Chamber Viewport: STANDARD VIEWPORT
Endpoint Type: EyeD IEP
CCM Cover: NO



Location is Malta, NY.
178362

AMAT  

DT HART 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Taichung, Taichung City, Taiwan
Applied Materials, Etch, DT HART , 300mm:
Manufactured in 2006; Status: Bagged and Skidded
182387

Applied Materials  

Enabler, Centura, 4 Chamber Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, AMAT, Enabler, Centura, 300mm Etch, :
Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch  

MULTIPLE UNITS AVAILABLE:  Please inquire.
192757

Applied Materials  

Centura DPS Poly Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Taichung, Taichung City, Taiwan
AMAT, Centura, DPS II, Poly Etch, 300mm,:
AMAT, Centura, DPS II, Poly Etch, 300mm,

4 Chamber System: 3x DPS II, Poly; 1x Axiom

S/N: 414018

DOM: 2007

Bagged & Skkidded In Warehouse

MULTIPLE UNITS AVAILABLE!!! Please inquire

192794

Applied Materials  

Centura DPS Metal W 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Taichung, Taichung City, Taiwan
AMAT, Centura, DPS II, Metal W Etch, 300mm,:
AMAT, Centura, DPS II, Metal W Etch, 300mm,

Chamber Configuration: 3x DPS II, 1 x Axiom

S/N: 413924

DOM: 2006

Bagged & Skidded in Warehouse

MULTIPLE UNITS AVAILABLE!!!  Please Inquire.
193144

Applied Materials  

Centura Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Dresden, Saxony, Germany
Applied Materials, Centura Etch, 300mm, :
Applied Materials, Centura Etch, 300mm, 

Centura AP Platform

Chambers : 2 x Minos, 1 x Carina, 1 x Axion

S/N : 423383


194911

Applied Materials  

Centura e-MAX CT+ 

List all items of this typePlasma Processing Equipment and Tools - Other

in Wafer Fabrication Equipment

1 Inquire Taichung, Taichung City, Taiwan
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher:
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher


S/N : 414583

!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
195983

Applied Materials  

Elite MS MC 

List all items of this typeScanning Electron Microscopes

in Microscopes, Optical Inspection

1 Inquire Dresden, Saxony, Germany
Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection:
Applied Materials, ELITE M5 MC, 300mm, e-Beam Inspection

iii Multiple Units Available.  Please inquire !!!
191508

Applied Materials  

Centura RTP XE 

List all items of this typeWafer Production Equipment - Other

in Wafer Fabrication Equipment

1 Inquire Singapore, Singapore
Applied Materials, Centura, RTP XE, 200mm:
Applied Materials, Centura, RTP XE, 200mm

S/N: R026
198213

Applied Materials  

Centura RTP XE+ 

List all items of this typeWafer Production Equipment - Other

in Wafer Fabrication Equipment

1 Inquire N* Singapore, Singapore
Applied Materials, Centura, RTP XE+, 200mm:
Applied Materials, Centura, RTP XE+, 200mm
TPCC Platform

Bagged & Skidded in Warehouse

2003 vintage

S/N: 400654

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.