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Other Chemical Vapor Deposition Equipment


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Item IDItem DescriptionDescriptionCass to Cass#PriceNotes Location
MakeModel
$
197026 Applied Materials Centura EPI2 Epi Chambers & 1 SiCoNi Chamber 1 Inquire East Fishkill, New York, United States
198214 Applied Materials Centura WxZCVD W Plug Deposition 1 Inquire Singapore, Singapore
198657 Applied Materials P5000Passivation system. 1 Inquire Singapore, Singapore
195174 ASM E3200 Epsilon 3200, Epitaxial Reactor 1 Inquire Dresden, Saxony, Germany
199194 ASM E3200300mm Reduced Pressure EPI deposition system 1 Inquire N* Dresden, Saxony, Germany
199195 ASM E3200 300mm EPI deposition system 1 Inquire N* Dresden, Saxony, Germany
195647 ASM Epsilon 3200Epi Deposition System 1 Inquire Dresden, Saxony, Germany
198242 Novellus Systems C3 SPEED MAXHigh Density Plasma CVD 1 Inquire Malta, New York, United States
191492 Picosun Sunale R-200Advanced ALD Reactor 1 Inquire F* East Fishkill, New York, United States
178249 Tel TriasManufactured in 2005; Status: Bagged and Skidded 1 Inquire Taichung, Taichung City, Taiwan
178252 Tel TriasManufactured in 2010; Status: CratedYES 1 Inquire Taichung, Taichung City, Taiwan
199090 Tokyo Electron Ltd Trias CVDMulti-Chamber TiN Deposition system 1 Inquire N* Taichung, Taichung City, Taiwan
199092 Tokyo Electron Ltd Trias CVDMulti-Chamber TiN Deposition system 1 Inquire N* Taichung, Taichung City, Taiwan

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.