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FULL DESCRIPTION of Item 178356

in Other Plasma Processing Equipment and Tools
Item ID: 178356

Offered1 Offered Inquire


Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch

Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260

Tool ID: ETX260

Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch
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Location: Dresden, SN, Germany
Unit Price Inquire
Number of Units 1
Manufacturer AMAT
Model Centura AP, AdvantEdge G5
Description Cold Idle - In Fab
Extended Description  Details at Equipment Data Sheet_ETX260 (3).pdf